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Plasma etching
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#	Item
11	Fluorocarbon-Based Passivation in STI Plasma Etching A.P. Milenina, R. Athimulama, M. Demanda, and B. Coenegrachtsb b Lam © IMECCONFIDENTIAL Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2012-05-24 09:11:51
12	1401 Reaction of Oxygen Plasma with Hydrogenated W-C Deposits Add to Reading List Source URL: www.djs.si Language: English - Date: 2014-07-21 14:39:02 Semiconductor device fabrication Tungsten compounds Nonmetals Superhard materials Tungsten carbide Oxide Tungsten Etching Carbon Chemistry Matter Chemical elements
13	Advances in Remote Plasma Sources for Cleaning 300 mm and Flat Panel CVD Systems Add to Reading List Source URL: www.mksinst.com Language: English - Date: 2008-11-17 11:26:52 Materials science Technology Plasma etching Plasma Chemical vapor deposition Etching Sputtering Ion source Ultra-high-purity steam for oxidation and annealing Semiconductor device fabrication Plasma processing Chemistry
14	Application Note ASTRON® Remote Plasma Source for Thin-Film Photovoltaic Process Chamber Cleaning PROBLEM The layers in a thin film photovoltaic (TFPV) device are deposited using deposition techniques, some of which hav Add to Reading List Source URL: www.mksinst.com Language: English - Date: 2013-04-15 15:40:35 Plasma processing Thin film deposition Technology Coatings Vacuum Thin film Chemical vapor deposition Plasma Etching Semiconductor device fabrication Materials science Chemistry
15	Microsoft Word - equipment_simulation_v12.doc Add to Reading List Source URL: www.iisb.fraunhofer.de Language: English - Date: 2015-06-08 12:05:06 Chemistry Plasma processing Thin film deposition Coatings Crystals Polycrystalline silicon Sputtering Etching Sputter deposition Semiconductor device fabrication Materials science Technology
16	Patterning of GST for Non volatile Phase-Change Memory Applications B. Salhi1, T. Chevolleau1, C. Vizioz2, C. Jahan2, S. Maitrejean2, C. Vallee1, T. Baron1, and O. Joubert1 1LTM Add to Reading List Source URL: www.leti.fr Language: English - Date: 2012-05-24 09:20:21 Technology Physics Etching Plasma etching Plasma Gete GeSbTe Semiconductor device fabrication Materials science Microtechnology
17	STUDY OF DAMAGE CAUSED BY NONREACTIVE Ar PLASMA ON AN ORGANIC LOW-K MATERIAL IMEC CORE CMOS JF de Marneffe, R. Ljazouli, L. Souriau, L. Zhang, C. Wilson, W. Boullart and M. R. Baklanov Add to Reading List Source URL: www.leti.fr Language: English* - Date: 2012-05-24 09:10:50 Leuven 0V Etching Plasma Physics Materials science Technology IMEC
18	Fluorocarbon-Based Passivation in STI Plasma Etching A.P. Milenina, R. Athimulama, M. Demanda, and B. Coenegrachtsb b Lam © IMECCONFIDENTIAL Add to Reading List Source URL: www.leti.fr Language: English - Date: 2012-05-24 09:11:51 Microtechnology Semiconductor device fabrication IMEC Leuven 45 nanometer 65 nanometer Etching OK Confidential Materials science Technology Electronics
19	SiCl4/Cl2 plasmas: a new chemistry to etch high-k material selectively to Si-based alloys P. Bodarta, G. Cungea, C. Petit-Etiennea, M. Darnona, M. Haassa, S. Bannab, O.Jouberta and T.Lillb a CNRS-LTM, Add to Reading List Source URL: www.leti.fr Language: English - Date: 2012-05-24 09:08:30 Plasma processing Technology Physics Etching Plasma CL2 Semiconductor device fabrication Materials science Microtechnology
20	Dry Etch and Plasma System 1. Scope 1.1 This document provides operating procedures and requirements to etch silicon or silica with gas plasma system. Add to Reading List Source URL: www.chemistry.hku.hk Language: English - Date: 2015-05-06 04:34:43 Visual arts Microtechnology Technology Plasma processing Plasma Isotropic etching Industrial etching Silicon dioxide Glass etching Semiconductor device fabrication Etching Materials science

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